Martin B. Anstice
Analyst · Jim Covello with Goldman Sachs
Thank you, Ernie, and good afternoon, everyone. As Ernie just reported, we had a solid finish to 2012, including a transformative year for Lam Research. The year began following our announced merger with Novellus Systems, and we aggressively executed plans to integrate both companies. On the strategic front, we presented a single face to our customers starting day 1, which is a function of our rigorous planning efforts, and we executed to the commitments made as 2 stand-alone companies. We enhanced our focus on core businesses and made the decision to divest the Peter Wolters business and transition PVD to a sustaining mode with existing customers. We have successfully combined organizations and made progress in streamlining our infrastructure. We have established an ambitious plan for integrating business systems and remain on track to complete the majority of that work by the middle of this year. We're well down the path towards achieving our target of $100 million in cost synergies. Related to capital structure, we repurchased approximately 39 million shares of stock, returning nearly $1.4 billion to our shareholders through 2012. This financing strategy monetized overall industry and economic conditions, lowering the effective purchase price of Novellus by approximately $200 million. Within our etch business, we had our customary opportunities and threats, successes and failures. But after more than a decade of absence for Lam, we are pleased to report today that we have now been successful in achieving a production tool of record selection by a leading logic company. We have received our first production tool order and expect business to continue to materialize in calendar year 2013. We are very pleased with these accomplishments and many more not called out today. They are testament to the dedication and hard work of our employees and the commitment to our values and vision by our leadership team. A big thank you is due to all. Relative to market share, we believe we are #1 or strong #2 in each of the product segments we now serve. We view this as crucial given the increasing focus by our customers and strategic partners to work with a select few leading equipment suppliers. Worthy of note for calendar 2012 in deposition and strip, we were successful in gaining critical back-end-of-line applications in PECVD at a couple of key logic manufacturers for both leading-edge production and next-generation device nodes. We acquired Axcelis' dry-strip intellectual property, further strengthening our product road map, particularly for non-oxidizing strip applications for advanced memory and logic. Overall, we are on a positive trajectory broadly, achieving shipped share across our targeted deposition markets in the mid-30% range and are realizing initial plans beyond traditional WFE growth to advanced packaging. In etch, we had forecast and we delivered in 2012 a relatively neutral year in terms of shipped share. More specifically, we successfully defended over 90% of the n and n+1 PTOR decisions that were made in 2012, and we positioned penetrations to gain a percentage point or so in the remaining selection decisions in 2013. We introduced next-generation uniformity control hardware for our conductor products. This capability is targeted for advanced logic and memory applications at the sub 20-nanometer technology node and is gaining traction with customers already. And as stated earlier, we achieved our goal of penetrating a leading logic company after a long period of absence. Turning to the single-wafer clean market. We've spoken about a few trends that have developed over the last couple of years. First is the transition from batch to single-wafer processing for front-end applications, and second is the introduction of high-productivity platforms. Lam is focused on developing a next-generation clean product, which will enable us to more effectively compete for a broader range of applications inclusive of these areas. We were successful in defending essentially 100% of the positions we held with our existing products in 2012. However, until the new product is released, our opportunities for share expansion are limited, and our shipped share will likely remain in the 20% range, plus or minus a couple of points, until that time. 2013 is a critical year for us in clean. We are actively testing and characterizing the new products and are on track to begin shipping beta units for key customer evaluations around the middle of this year. Overall, we remain committed to deliver against our long-term share gain targets of 3% to 5% in etch, 4% to 8% in deposition and 5 to 10 percentage points in single-wafer clean. We have confidence in our ability to develop the best-in-class products and leverage our recently expanded adjacencies to deliver differentiated solutions to capture a disproportionate number of the opportunities created by technology inflections. As discussed extensively before, the inflections, including patterning, FinFET, 3D NAND and TSV, are all creating growth opportunities. Sometimes, those are measured in terms of market share expansion and sometimes in terms of market size expansion. Our continued execution and decision making to reinforce customer trust are fundamental to achieving our goals. Touching briefly on the industry environment, we had outlined a scenario for WFE spending to be within a range of $30 billion in 2013 last November. From our perspective at the segment level, NAND investment remains the primary uncertain influence over 2013 spending. Obviously, the macro remains a major consideration also. Based on our analysis, since November, a couple of additional inputs have been made available: slight upticks in outlooks for WFE in 2013 from 2 of the top 3 semiconductor companies, and a slight reduction in NAND spending due to likely higher proportion of conversion than originally planned. Taken as a whole, the $30 billion WFE level, plus or minus $2 billion, remains our planning assumption. As we discussed during our recent analyst event, our view is based on the following primary assumptions. For a third straight year, we are forecasting essentially no new capacity additions for DRAM with bit growth demand in the range of 30%, investments are limited to upgrades and conversions. In NAND, we are forecasting demand growth in a range of 50%, which would require capacity investments to resume towards the middle of this year. Absent any new capacity additions, we believe supply would be limited to around 40% bit growth through conversions. 3D NAND investments are seen to be late in the year, and we currently forecast approximately 20,000 wafer starts of 3D NAND capacity to ship by the end of 2013. We project foundries to strongly continue making 28-nanometer investments and forecast 28-, 32-nanometer capacity in the range of 330,000 wafer starts, plus or minus, per month exiting 2013. Additionally, 20-nanometer will begin to ramp in the second half, and we currently expect total capacity to reach approximately 40,000 wafer starts at that node by the end of the year. Finally, our forecast reflects a slight decline year-over-year in other logic spending with the potential for upside given recently announced spending plans. Using $30 billion as our baseline, our resulting expectation is for spending to increase through the year with approximately 55% of total spending occurring in the second half. In this environment, given the consolidation of our customer base and overall competitive dynamics, we continue to fund long-term strategic investments and execute the strategies that we articulated during our recent analyst event. To name a few areas of focus, we're engaging with customers on conformal film applications by leveraging our ability to deposit metals and dielectrics in high aspect ratio structures with the atomic layer precision required for FinFET devices. We're engineering tungsten films with the lowest resistivity for filling these structures, which ultimately benefits the electrical performance of the device. We've introduced proprietary hardware on our conductor etch tool, which enables selectivity at the atomic level required by high aspect ratio features. We've designed that same proprietary hardware for our dielectric tool, which widens the process window, enabling customers to achieve their stringent requirements associated with high aspect ratio processes also in 3D NAND. In addition, in 3D NANDs, we're combining our strengths in defectivity control and process repeatability, both important in logic applications with the productivity advantages offered by our multi-station sequential deposition architecture to strengthen our PTOR positions in PECVD. In through-silicon via, we are leveraging our knowledge as a market leader in Electrofill and advanced pretreatments to grow our market share. We're also working towards capturing all available benefits of the merger with Novellus. Ernie outlined our progress to achieving our stated cost synergy targets. Beyond that, our focus is on executing plans to achieve accelerated growth and deliver on the value proposition this union brings to our customers and shareholders. Finally, we remain focused on prudently managing spending, which includes our commitment to contain quarterly operating expenses to a level no greater than $305 million per quarter at $1 billion revenue level through 2013. Turning now to our outlook for the March 2013 quarter. Our non-GAAP guidance is as follows: shipments of $880 million, plus or minus $30 million; revenues of $830 million, plus or minus $30 million; gross margin at 43.5%, plus or minus 1%; operating profit at 8%, plus or minus 1.5%; and earnings per share of $0.35, plus or minus $0.07, based on a share count of approximately 170 million shares. Prior to taking questions, I would like to take a moment on behalf of the board of directors, the management team and the employee population to recognize Ernie for his dedication of service to Lam for the past 15 years and especially for his service as CFO. Ernie has made a big impact on the company throughout his tenure. He has a work ethic that is truly remarkable. He sets a standard of performance that challenges those around him to achieve more than they thought possible. And he has a versatility level that has accommodated the significant breadth of responsibilities held during his time at Lam. As noted in our press release today, Ernie's planned departure will be handled smoothly and without disruption to our customers, our shareholders or our employees. We have an active search ongoing, and Ernie will remain until a new person is in place and plans to assist in the transition. I would like to extend my sincere thanks to Ernie for his service, for his accomplishments and his commitment to the company, our shareholders and our employees throughout his career and wish him every success in his future. We will now open the call for Q&A.